1 May 1994 Plasma flare of pulsed-microwave surface discharge in vacuum for thin film deposition and materials processing
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Proceedings Volume 2259, XVI International Symposium on Discharges and Electrical Insulation in Vacuum; (1994) https://doi.org/10.1117/12.174599
Event: XVI International Symposium on Discharges and Electrical Insulation in Vacuum, 1994, Moscow-St. Petersburg, Russian Federation
Abstract
The present report consists of three parts. The first one is a brief review of experimental works accomplished in MRT Institute and devoted to a study of nonlinear interaction of strong microwaves (in X-band at intensities of 0.01 - 10 MW/cm2 and pulse duration from 50 - 100 nsec up to 1 - 10 microseconds) with a plasma flare, and of attendant physical processes. The small experimental plasma reactor bench is described in the second part. And the third part of our report reflects the first qualitative experiments on pulsed microwave deposition of thin carbon and metal films on various substrates. Obtained practical results and technique perspectives are discussed in detail.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander A. Ravaev, Alexander A. Ravaev, Alexander V. Medvedovsky, Alexander V. Medvedovsky, Pavel S. Chernyshev, Pavel S. Chernyshev, } "Plasma flare of pulsed-microwave surface discharge in vacuum for thin film deposition and materials processing", Proc. SPIE 2259, XVI International Symposium on Discharges and Electrical Insulation in Vacuum, (1 May 1994); doi: 10.1117/12.174599; https://doi.org/10.1117/12.174599
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