1 May 1994 Vacuum-arc plasma deposition: macroparticle filtering, scaling, and other problems
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Proceedings Volume 2259, XVI International Symposium on Discharges and Electrical Insulation in Vacuum; (1994) https://doi.org/10.1117/12.174640
Event: XVI International Symposium on Discharges and Electrical Insulation in Vacuum, 1994, Moscow-St. Petersburg, Russian Federation
Abstract
Micron-size macroparticles can be removed from vacuum arc plasmas using magnetic filters, permitting the deposition of high-quality thin films of the cathode material. The principle of magnetic filtering is explained, and ways of improving filter efficiency using additional electric and magnetic fields are explored. Under optimum conditions, about 25% of all ions entering the filter can be used for deposition. Other problems such as down or upscaling of deposition facilities are briefly discussed.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andre Anders, Andre Anders, Simone Anders, Simone Anders, Ian G. Brown, Ian G. Brown, Robert A. MacGill, Robert A. MacGill, Michael R. Dickinson, Michael R. Dickinson, "Vacuum-arc plasma deposition: macroparticle filtering, scaling, and other problems", Proc. SPIE 2259, XVI International Symposium on Discharges and Electrical Insulation in Vacuum, (1 May 1994); doi: 10.1117/12.174640; https://doi.org/10.1117/12.174640
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