7 October 1994 OMNISCATRTM: a high-speed, high-resolution three-dimensional scatterometer measures complex scatter interference and diffraction patterns
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Abstract
With OMNISCATR's high resolution and three-dimensional light scatter measurement capabilities, a new method is now available for analyzing surface and material properties such as tooling or etching patterns, contamination, and bulk defects. Scatter data from patterned wafers, sub-micron grit particles, and defective interocular lenses is presented.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Raymond J. Castonguay, "OMNISCATRTM: a high-speed, high-resolution three-dimensional scatterometer measures complex scatter interference and diffraction patterns", Proc. SPIE 2260, Stray Radiation in Optical Systems III, (7 October 1994); doi: 10.1117/12.189218; https://doi.org/10.1117/12.189218
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