Paper
7 September 1994 Low-energy high-flux reactive ion-assisted deposition of oxide optical coatings: performance, durability, stability, and scalability
Walter T. Pawlewicz, Thomas R. Culver, Michael W. Chiello, John H. Zachistal, Sherman R. Walters, D. A. Allen
Author Affiliations +
Abstract
Advanced deposition technologies produce optical coatings with state-of- art-optical performance, improved durability, stability and lifetime and sometimes improved scalability to large optics and small-optics volume coating. This paper examines a low-energy, high-flux reactive ion assist process developed at Itek during the past four years from this perspective. The process is introduced at the fundamental level of ion and atom energetics and arrival ratios, with both inert and reactive gases. Earlier high-voltage, low-current approaches are contrasted. The manifold benefits of coating densification, improved stoichiometry, low-temperature processing and in situ substrate cleaning are described. Process implementation in mid-sized and large coating chambers is pictorially illustrated. Inexpensive retrofit is realized. Very low absorption, enhanced durability and precision mechanical stress control are demonstrated with selected highlights of recent Itek optical coating experiences. Examples of especially-interesting optics recently coated are shown. Competing coating technologies are compared.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Walter T. Pawlewicz, Thomas R. Culver, Michael W. Chiello, John H. Zachistal, Sherman R. Walters, and D. A. Allen "Low-energy high-flux reactive ion-assisted deposition of oxide optical coatings: performance, durability, stability, and scalability", Proc. SPIE 2262, Optical Thin Films IV: New Developments, (7 September 1994); https://doi.org/10.1117/12.185776
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Cited by 4 scholarly publications.
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KEYWORDS
Coating

Ions

Absorption

Oxides

Optical coatings

Chemical species

Reflectivity

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