7 September 1994 Rate-controlled synthesis of composition-modulated metal oxide thin films
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Abstract
The development of advanced deposition technologies is continuously evolving for the synthesis of oxide coatings used in optical applications. Recent progress is made in the use of magnetron sputtering to reactively deposit metal-oxide thin films. The sputter deposition parameters are chosen with respect to the reaction kinetics of the metal-oxide system to enable a variation of composition along the film growth direction. The key process parameter to control is the sputtering rate of the target. The shape of the composition profile directly corresponds to the preselected variation of deposition rate. By simply varying the sputtering rate using a working gas that consists of an inert-oxygen mixture, structures are synthesized with composition profiles which can be either abrupt or graded in the growth direction. The result is a compositionally modulated structure of the metal-oxide system. This procedure for composition modulated synthesis is demonstrated for metals which are highly reactive with oxygen as well as for those metals which are not. The development of this deposition methodology will facilitate the design of metal oxide films for optical applications, as in gradient-index filters for example. Results are presented for the reactive sputter deposition of metal oxide coatings in the yttrium-oxide, molybdenum-oxide, and copper-oxide systems.
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Alan F. Jankowski, Alan F. Jankowski, "Rate-controlled synthesis of composition-modulated metal oxide thin films", Proc. SPIE 2262, Optical Thin Films IV: New Developments, (7 September 1994); doi: 10.1117/12.185794; https://doi.org/10.1117/12.185794
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