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23 September 1994 Analog phase holograms by electron-beam lithography
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Abstract
Phase holograms have been created on the surface of a thin film of poly-methyl methacrylate (PMMA, Plexiglas) by direct-write electron beam (E-Beam) lithography. The process involves delivering a patterned exposure dose followed by partial development with a strong developer. The patterned dose derives from arbitrary computer-calculated holograms, which must be corrected for the sensitivity characteristic of the PMMA and for the effective point-spread function of the E-Beam.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul D. Maker and Richard E. Muller "Analog phase holograms by electron-beam lithography", Proc. SPIE 2267, Advanced Microdevices and Space Science Sensors, (23 September 1994); https://doi.org/10.1117/12.187478
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