Paper
17 October 1994 Flat-panel thermal infrared scene generator
R. Barry Johnson, Ronald Chung, Michael Gaitan, David Berning
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Abstract
For over two decades, researchers have investigated a wide variety of technologies for use as a real-time infrared scene generator. During the past several years, the most promising technology to meet the myriad of applications appears to be the silicon micromachined resistive-array approach. Each thermal pixel is created by a micro-scale resistor. The present investigation reports the results achieved by using the standard commercial CMOS foundry process, rather than a costly custom CMOS process, to produce the chip and the subsequent post-foundry etching. Both chip-level and pixel-specific electronics are readily included on the chip since IC technology is employed. Principles used in device architecture formulation, chip design, and fabrication of large arrays of these thermal pixels are discussed. Experimental results of recent array designs are presented and illustrate that low-cost, high-performance flat- panel thermal infrared displays are now viable and practicable.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Barry Johnson, Ronald Chung, Michael Gaitan, and David Berning "Flat-panel thermal infrared scene generator", Proc. SPIE 2269, Infrared Technology XX, (17 October 1994); https://doi.org/10.1117/12.188649
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CITATIONS
Cited by 7 scholarly publications.
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KEYWORDS
Thermography

Infrared radiation

Infrared technology

Silicon

Resistance

Standards development

Etching

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