Grid patterns in high-Z material for x-ray and gamma-ray collimation and modulation to achieve imaging

H. Frank van Beek

doi:10.1117/12.188833

4 October 1994 Grid patterns in high-Z material for x-ray and gamma-ray collimation and modulation to achieve imaging

H. Frank van Beek

Proceedings Volume 2270, NASA/SPIE Conference on Spin-Off Technologies from NASA for Commercial Sensors and Scientific Applications; (1994) https://doi.org/10.1117/12.188833
Event: SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, 1994, San Diego, CA, United States

Abstract

For the imaging of X-rays and gamma-rays above the energy of about 10 keV (wavelength shorter than 0.12 nanometer) lenses or mirrors cannot be used. For future X-ray and gamma- ray imaging instruments, configurations of patterns of slits and detectors are proposed where, with the help of Fourier analyses of the observed temporal and spatial radiation modulation, images can be composed with a spatial resolution in the arcsecond domain. The patterns of slits, called `grids', are difficult to realize because of the small slit width and the severe requirements on the slit position, given the required thickness of the material. Now these patterns of slits can be made, it has sense to investigate what other instruments or products could make use of this grid manufacturing technique. First of all, this paper describes in short the method of grid manufacturing dealt with here and the most significant characteristics of these grids. The technique allows for the manufacturing of similar grids, with other slit width, slit mutual distance, slit viewing direction, etc. The second part of this paper suggests some possible applications of grids that could be made with the same technique, for the field of medicine, crystallography and other fields. These suggestions may initiate other applications, not yet thought of.

Citation Download Citation

H. Frank van Beek "Grid patterns in high-Z material for x-ray and gamma-ray collimation and modulation to achieve imaging", Proc. SPIE 2270, NASA/SPIE Conference on Spin-Off Technologies from NASA for Commercial Sensors and Scientific Applications, (4 October 1994); https://doi.org/10.1117/12.188833

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
6 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

X-rays

Sensors

Manufacturing

X-ray imaging

Modulation

Gamma radiation

Optics manufacturing

Show All Keywords

Keywords/Phrases

Search In:

Publication Years