Properties of the oxidation on Hg1-xCdxTe by ellipsometry

Xierong Hu; Runqing Jiang; Fei-Fei Wu; Shuzhi Zhang; Xiangyang Li; Jiaxiong Fang; Guosen Xu; Jie Shen; Xiaoning Hu

doi:10.1117/12.189232

7 October 1994 Properties of the oxidation on Hg_1-xCd_xTe by ellipsometry

Xierong Hu, Runqing Jiang, Fei-Fei Wu, Shuzhi Zhang, Xiangyang Li, Jiaxiong Fang, Guosen Xu, Jie Shen, Xiaoning Hu

Proceedings Volume 2274, Infrared Detectors: State of the Art II; (1994) https://doi.org/10.1117/12.189232
Event: SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, 1994, San Diego, CA, United States

Abstract

The rates of growth on oxide films on polished Hg_1-xCd_xTe surfaces exposed to room air are obtained by measuring the ellipticity of polarized light reflected from the surfaces with the ellipsometer. Plots of thickness vs. the logarithm of the time in room air are linear after about 1500 minutes with slopes of 15 angstroms/decade. Immediately after polishing the native oxide film is proximately 10 angstroms thick and increase in thickness by about 36 angstroms after one week. Measurements utilizing polarized light are made of the increase in film thickness with time on Hg_1-xCd_xTe surfaces immersed in water. The regular of the anodization voltage versus time was given. With ellipsometer, the thickness of anodic oxides film grown on Hg_1-xCd_xTe is determined. Further details and discussion will be presented.

Citation Download Citation

Xierong Hu, Runqing Jiang, Fei-Fei Wu, Shuzhi Zhang, Xiangyang Li, Jiaxiong Fang, Guosen Xu, Jie Shen, and Xiaoning Hu "Properties of the oxidation on Hg_1-xCd_xTe by ellipsometry", Proc. SPIE 2274, Infrared Detectors: State of the Art II, (7 October 1994); https://doi.org/10.1117/12.189232

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