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7 November 1994 Multilayer thin-film polarizer design for the far ultraviolet using the induced transmission and absorption technique
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Abstract
Good theoretical designs of far ultraviolet polarizers have been reported using a MgF2/Al/MgF2 three layer structure on a thick Al layer as a substrate. The thicknesses were determined to induce transmission and absorption of p-polarized light. In these designs Al optical constants were used from films produced in ultrahigh vacuum (UHV:10-10 torr). Reflectance values for polarizers fabricated in a conventional high vacuum (p approximately 10-6 torr) using the UHV design parameters differed dramatically from the design predictions. Al is a highly reactive material and is oxidized even in a high vacuum chamber. In order to solve the problem other metals have been studied. It is found that a larger reflectance difference is closely related to higher amplitude and larger phase difference of Fresnel reflection coefficients between two polarizations at the boundary of MgF2/metal. It is also found that for one material a larger angle of incidence from the surface normal brings larger amplitude and phase difference. Be and Mo are found good materials to replace Al. Polarizers designed for 121.6 nm with Be at 60 degree(s) and with Mo at 70 degree(s) are shown as examples.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jongmin Kim, Muamer Zukic, Michele Wilson McColgan, Jong Ho Park, and Douglas G. Torr "Multilayer thin-film polarizer design for the far ultraviolet using the induced transmission and absorption technique", Proc. SPIE 2283, X-Ray and Ultraviolet Spectroscopy and Polarimetry, (7 November 1994); https://doi.org/10.1117/12.193182
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