13 October 1994 Fabrication and optical properties of multilayer epitaxial ferroelectric nX(SrTiO3/PbTiO3) thin films by the sol-gel technique
Author Affiliations +
Abstract
The sol-gel process was used to form ferroelectric epitaxial PbTiO3 and SrTiO3 thin films on single crystal SrTiO3 substrates. In this study, optically transparent multilayer n$CHI[SrTiO3/PbTiO3] thin films were grown successfully along the (001) direction on single crystal SrTiO3 substrates. Lead titanium double alkoxide and strontium titanium double alkoxide were used as precursors. The layers of transparent PbTiO3 films were obtained by heat treatment at 700 degree(s)C in PbO atmosphere, while the layers of SrTiO3 were obtained at 800 degree(s)C in air. The average thickness of each PbTiO3 or SrTiO3 layer was measured by SEM analysis. The change of optical transmittance with wavelength for a sample with 12 (6$CHI[SrTiO3/PbTiO3]) layers film was measured. The refractive index of PbTiO3 and SrTiO3 films grown on Si substrates was measured with respect to film thickness. The epitaxial growth of the PbTiO3 thin films and SrTiO3 thin films was investigated using XRD, HRTEM, and SEM analysis. The structure, growth parameters, and optical properties of the films are discussed.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yudan Lou, Yuhuan Xu, John D. Mackenzie, "Fabrication and optical properties of multilayer epitaxial ferroelectric nX(SrTiO3/PbTiO3) thin films by the sol-gel technique", Proc. SPIE 2288, Sol-Gel Optics III, (13 October 1994); doi: 10.1117/12.188940; https://doi.org/10.1117/12.188940
PROCEEDINGS
10 PAGES


SHARE
KEYWORDS
Thin films

Multilayers

Crystals

Sol-gels

Optical properties

Single crystal X-ray diffraction

Metals

RELATED CONTENT


Back to Top