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13 October 1994 Vapor-gel deposition method for optical coatings
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Abstract
A vapor-gel process is implemented to achieve deposition of stoichiometric LiTaO3 on a variety of substrates using LiTa(OButn)6 precursor. Such process involves the vapor- phase hydrolysis of volatile double alkoxides, and polycondensation of the partially hydrolyzed double alkoxide on heated substrates. It was demonstrated that an intrinsically stoichiometric vapor-deposition can be realized using heterometalorganic complexes and the hydrolysis- polycondensation reaction scheme. We report typical deposition and annealing conditions used in this study, x-ray diffraction, SEM and composition analyses of the films grown on fused silica, Pt, sapphire (1010) and LiNbO3 (0006). Composition analysis achieved by measurement of lattice parameters confirmed that the vapor-gel method using double alkoxide can produce high quality, stoichiometric LiTaO3. Mass spectrometric study of the precursor compound LiTa(OButn)6 suggests that the volatile species responsible for the stoichiometric vapor deposition is Li2Ta2(OButn)12. Rocking curve measurement indicated excellent epitaxial growth of LiTaO3 on LiNbO3 (0006).
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kueir Weei Chour and Ren Xu "Vapor-gel deposition method for optical coatings", Proc. SPIE 2288, Sol-Gel Optics III, (13 October 1994); https://doi.org/10.1117/12.188979
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