7 December 1994 Attenuated phase-shifting mask blanks for the deep ultraviolet
Author Affiliations +
ULCOAT has developed an attenuated phase shifting mask blank which has entered the production level for i-line blanks, with 180 degree(s) shifting angle and 5% to 20% transmittance. A single layer of MoSiON is employed as the phase shifter. Its simple structure enables good repeatability and stability in the mask making process. This single layer has 5% to 8% transmittance, with 180 degree(s) shifting angle at the deep ultra violet level (KrF Laser). However, it cannot be inspected at 488 nm (the wavelength of a popular pattern checker), due to more than 40% transmittance at that wavelength. Therefore, for deep ultra violet level work, a multi-layer type of MoSiON has been developed by ULCOAT, which achieves less than 40% transmittance at 488 nm.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasuo Tokoro, Yasuo Tokoro, Susumu Kawada, Susumu Kawada, Tsuneo Yamamoto, Tsuneo Yamamoto, Yoshihiro Saito, Yoshihiro Saito, Atsushi Hayashi, Atsushi Hayashi, Akihiko Isao, Akihiko Isao, } "Attenuated phase-shifting mask blanks for the deep ultraviolet", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195836; https://doi.org/10.1117/12.195836

Back to Top