Translator Disclaimer
7 December 1994 Attenuated phase-shifting mask blanks for the deep ultraviolet
Author Affiliations +
ULCOAT has developed an attenuated phase shifting mask blank which has entered the production level for i-line blanks, with 180 degree(s) shifting angle and 5% to 20% transmittance. A single layer of MoSiON is employed as the phase shifter. Its simple structure enables good repeatability and stability in the mask making process. This single layer has 5% to 8% transmittance, with 180 degree(s) shifting angle at the deep ultra violet level (KrF Laser). However, it cannot be inspected at 488 nm (the wavelength of a popular pattern checker), due to more than 40% transmittance at that wavelength. Therefore, for deep ultra violet level work, a multi-layer type of MoSiON has been developed by ULCOAT, which achieves less than 40% transmittance at 488 nm.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasuo Tokoro, Susumu Kawada, Tsuneo Yamamoto, Yoshihiro Saito, Atsushi Hayashi, and Akihiko Isao "Attenuated phase-shifting mask blanks for the deep ultraviolet", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994);

Back to Top