7 December 1994 Attenuated phase-shifting mask blanks for the deep ultraviolet
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Abstract
ULCOAT has developed an attenuated phase shifting mask blank which has entered the production level for i-line blanks, with 180 degree(s) shifting angle and 5% to 20% transmittance. A single layer of MoSiON is employed as the phase shifter. Its simple structure enables good repeatability and stability in the mask making process. This single layer has 5% to 8% transmittance, with 180 degree(s) shifting angle at the deep ultra violet level (KrF Laser). However, it cannot be inspected at 488 nm (the wavelength of a popular pattern checker), due to more than 40% transmittance at that wavelength. Therefore, for deep ultra violet level work, a multi-layer type of MoSiON has been developed by ULCOAT, which achieves less than 40% transmittance at 488 nm.
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Yasuo Tokoro, Yasuo Tokoro, Susumu Kawada, Susumu Kawada, Tsuneo Yamamoto, Tsuneo Yamamoto, Yoshihiro Saito, Yoshihiro Saito, Atsushi Hayashi, Atsushi Hayashi, Akihiko Isao, Akihiko Isao, } "Attenuated phase-shifting mask blanks for the deep ultraviolet", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195836; https://doi.org/10.1117/12.195836
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