7 December 1994 Chromium-based attenuated embedded shifter preproduction
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Abstract
Attenuated embedded phase shifting photomask technology can improve lithography performance for both g-line and i-line steppers. Emphasis at i-line is shifting from development to production as lithographers integrate phase shifting masks into their processes. This paper describes pilot production of i-line and g-line, Cr-based, attenuated embedded phase shifter photoblanks and photomasks.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Franklin D. Kalk, Roger H. French, H. Ufuk Alpay, Greg P. Hughes, "Chromium-based attenuated embedded shifter preproduction", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195825; https://doi.org/10.1117/12.195825
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