7 December 1994 Chromium-based attenuated embedded shifter preproduction
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Abstract
Attenuated embedded phase shifting photomask technology can improve lithography performance for both g-line and i-line steppers. Emphasis at i-line is shifting from development to production as lithographers integrate phase shifting masks into their processes. This paper describes pilot production of i-line and g-line, Cr-based, attenuated embedded phase shifter photoblanks and photomasks.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Franklin D. Kalk, Franklin D. Kalk, Roger H. French, Roger H. French, H. Ufuk Alpay, H. Ufuk Alpay, Greg P. Hughes, Greg P. Hughes, } "Chromium-based attenuated embedded shifter preproduction", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195825; https://doi.org/10.1117/12.195825
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