7 December 1994 Improved excimer laser pattern generator for photomask fabrication
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Abstract
This paper describes a laser pattern generator constructed by modifying a GCA 3600F tool for the production of research photomasks. The mercury arc lamp illumination source was replaced with an excimer laser. Extensive modifications made to the subsystems and software are described. The result is a tool with a 25X average throughput improvement, a resolution of 1.0 micrometers , and an 8X increase in overlay precision. The laser pattern generator retains the ease of operation of the original system and exhibits improved reliability. The overall cost of the implemented improvements is a small percentage of a state-of-the-art laser or electron beam mask generation tool. We report on the results of generating 2X, 5X and 10X reticles as well as 1X photomasks from the past three years.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James L. Speidell, James L. Speidell, Steven A. Cordes, Steven A. Cordes, A. Ferry, A. Ferry, } "Improved excimer laser pattern generator for photomask fabrication", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195847; https://doi.org/10.1117/12.195847
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