7 December 1994 MEBES 4000 optimization and characterization of MEBES 4500
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Abstract
Performance of a MEBES tool depends in part on how well it is optimized for a particular user application. This paper examines the efforts made to optimize a MEBES 4000 at Intel to meet performance goals of 350 nm design rules. The areas of particular concern are critical dimension, resolution, and composite positional accuracy. PBS resist processes and cassette- specific corrections (CAZOC) for six cassettes are examined to meet these goals. As part of a SEMATECH development program, a MEBES 4000 system at Etec is being upgraded to a MEBES 4500. The performance of the tool is characterized at each incremental phase of the upgrade. Results show that significant advances have been made in accuracy, system calibration and control, and data path.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jim DeWitt, Jim DeWitt, J. Millino, J. Millino, Joe Watson, Joe Watson, Robert L. Dean, Robert L. Dean, Frederick Raymond, Frederick Raymond, D. McClure, D. McClure, Leonard Gasiorek, Leonard Gasiorek, Frank E. Abboud, Frank E. Abboud, Robert J. Naber, Robert J. Naber, } "MEBES 4000 optimization and characterization of MEBES 4500", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195805; https://doi.org/10.1117/12.195805
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