7 December 1994 Overview of extreme ultraviolet lithography
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Abstract
Extreme UV lithography offers the possibility of printing CDs of 100 nm and smaller with a reduction tool. Because of the wavelength used, the optics have to be all-reflecting. The tool depends on multilayer coatings for the mirrors. A laser-produced plasma is being developed as a granular source. The mask also has to be reflecting. Top surface imaging resist will be used. The work here described is being performed in a National Program set up by the U.S. Department of Energy.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Frits Zernike, Frits Zernike, } "Overview of extreme ultraviolet lithography", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195842; https://doi.org/10.1117/12.195842
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