Extreme UV lithography offers the possibility of printing CDs of 100 nm and smaller with a reduction tool. Because of the wavelength used, the optics have to be all-reflecting. The tool depends on multilayer coatings for the mirrors. A laser-produced plasma is being developed as a granular source. The mask also has to be reflecting. Top surface imaging resist will be used. The work here described is being performed in a National Program set up by the U.S. Department of Energy.