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7 December 1994 Overview of extreme ultraviolet lithography
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Abstract
Extreme UV lithography offers the possibility of printing CDs of 100 nm and smaller with a reduction tool. Because of the wavelength used, the optics have to be all-reflecting. The tool depends on multilayer coatings for the mirrors. A laser-produced plasma is being developed as a granular source. The mask also has to be reflecting. Top surface imaging resist will be used. The work here described is being performed in a National Program set up by the U.S. Department of Energy.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Frits Zernike "Overview of extreme ultraviolet lithography", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195842
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