Two-level masks for increased depth of focus

Rudolf M. von Buenau; Ricardo A. Diola; Paul DePesa; Stanney M. Kay; David A. Markle; Elizabeth Tai; Roger Fabian W. Pease

doi:10.1117/12.195837

7 December 1994 Two-level masks for increased depth of focus

Rudolf M. von Buenau, Ricardo A. Diola, Paul DePesa, Stanney M. Kay, David A. Markle, Elizabeth Tai, Roger Fabian W. Pease

Author Affiliations +

Proceedings Volume 2322, 14th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.195837
Event: 14th Annual BACUS Symposium on Photomask Technology and Management, 1994, Santa Clara, CA, United States

Abstract

We have explored two-level, or `twin' masks as a mask-based means of increasing depth of focus. Simulations have shown that the technique offers substantial gains for a variety of pattern types. To verify this experimentally, we have fabricated a test mask containing two- level as well as conventional mask patterns. We have performed through-focus series of photoresist exposures and demonstrated the expected improvement in focus latitude.

Citation Download Citation

Rudolf M. von Buenau, Ricardo A. Diola, Paul DePesa, Stanney M. Kay, David A. Markle, Elizabeth Tai, and Roger Fabian W. Pease "Two-level masks for increased depth of focus", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195837

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