12 December 1994 Integration of photochemical processes of silicon surface cleaning with deposition of thin solid films
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Proceedings Volume 2332, Second International Symposium on Advanced Laser Technologies; (1994) https://doi.org/10.1117/12.195878
Event: Advanced Laser Technologies: International Symposium, 1993, Prague, Czech Republic
Abstract
The possibility of a low temperature technique development including combined photochemical processes of the silicon substrate cleaning, chemical vapor deposition and post treatment of SiO2 has been demonstrated.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. P. Alekhin, A. P. Alekhin, Yu. S. Bokov, Yu. S. Bokov, L. A. V'iukov, L. A. V'iukov, A. M. Markeev, A. M. Markeev, V. N. Nevolin, V. N. Nevolin, N. S. Samsonov, N. S. Samsonov, V. Yu. Fominski, V. Yu. Fominski, } "Integration of photochemical processes of silicon surface cleaning with deposition of thin solid films", Proc. SPIE 2332, Second International Symposium on Advanced Laser Technologies, (12 December 1994); doi: 10.1117/12.195878; https://doi.org/10.1117/12.195878
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