14 September 1994 Reliability improvement of integrated circuits through alkali contamination reduction in dielectric films
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Abstract
As geometries continue to shrink, the reduction of alkali ion contamination in integrated circuits is imperative. A Motorola factory established a goal to achieve greater than an order of magnitude reduction in alkali ion levels through characterization and elimination of the sources. Various teams contributed to the overall goal by identifying sources and focusing on reducing or eliminating the alkali ion levels. Reliability improvements have been accomplished over the past three years utilizing this methodology.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Carrie Lundquist, Carrie Lundquist, Tara Allen, Tara Allen, Rafael Delgado, Rafael Delgado, S. Dunnigan, S. Dunnigan, J. Cadenhead, J. Cadenhead, Karl E. Mautz, Karl E. Mautz, Jim Peterson, Jim Peterson, H. Stevens, H. Stevens, } "Reliability improvement of integrated circuits through alkali contamination reduction in dielectric films", Proc. SPIE 2334, Microelectronics Manufacturability, Yield, and Reliability, (14 September 1994); doi: 10.1117/12.186755; https://doi.org/10.1117/12.186755
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