16 September 1994 Submodule for the laser vacuum projection lithography
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Abstract
The present paper gives the results of investigations of the process of the laser vacuum projection lithography (LVPL) and design of a laser projection stepper, ensuring practical implementation of the proposed process. The LVPL principles, fields of application are discussed, the LVPL EM-5094 submodule specifications are given and its test results are provided.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eduard I. Tochitsky, A. V. Baranov, Victor V. Boksha, Vyjacheslav E. Obukhov, Anatoly I. Sharendo, Y. I. Tochitsky, Victor Adamovich Azarko, V. Lopatko, "Submodule for the laser vacuum projection lithography", Proc. SPIE 2336, Manufacturing Process Control for Microelectronic Devices and Circuits, (16 September 1994); doi: 10.1117/12.186792; https://doi.org/10.1117/12.186792
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