New approach to measuring oxide charge and mobile ion concentration

Piotr Edelman; Andrew M. Hoff; Lubek Jastrzebski; Jacek J. Lagowski

doi:10.1117/12.186641

14 September 1994 New approach to measuring oxide charge and mobile ion concentration

Piotr Edelman, Andrew M. Hoff, Lubek Jastrzebski, Jacek J. Lagowski

Proceedings Volume 2337, Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing; (1994) https://doi.org/10.1117/12.186641
Event: Microelectronic Manufacturing, 1994, Austin, TX, United States

Abstract

We discuss the determination of oxide charge from simultaneous noncontact measurement of the surface potential barrier, V_s, (via surface photovoltage) and the voltage drop across the oxide, V_ox, (via contact potential vibrating probe). These two measurements enable us to separate the contributions from total charge and oxide charge. In combination with corona charging and low temperature stress, this approach can be used for wafer-scale determination of the mobile Na⁺ concentration. The principles of the approach are presented and typical results are given which contrast the effects of ion drift and charge injection in the oxide. Experimental results also illustrate the noncontact, wafer-scale mapping of the mobile ion distribution.

Citation Download Citation

Piotr Edelman, Andrew M. Hoff, Lubek Jastrzebski, and Jacek J. Lagowski "New approach to measuring oxide charge and mobile ion concentration", Proc. SPIE 2337, Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing, (14 September 1994); https://doi.org/10.1117/12.186641

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