26 October 1994 Absorption behavior of the thin silver films deposited on fracture surfaces of alpha-Al2O3 ceramics
Author Affiliations +
Proceedings Volume 2364, Second International Conference on Thin Film Physics and Applications; (1994) https://doi.org/10.1117/12.190767
Event: Thin Film Physics and Applications: Second International Conference, 1994, Shanghai, China
Abstract
A new type of roughness silver thin films deposited on fractal surfaces of (alpha) -Al2O3 ceramics were prepared by rf- magnetron sputtering. The electrical properties of the Ag films are strongly dependant on the air pressure around the sample. When air pressure decreases to a certain value, a big jump of electrical resistant happens and the Ag thin film exhibits nonlinear I-V behavior. When releasing air into the vacuum chamber and the air pressure is raised, the film resistance restores to the primitive value and the nonlinear behavior then disappears.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuqing Xu, Gao-xiang Ye, Xiang-Ming Tao, Qi-rui Zhang, "Absorption behavior of the thin silver films deposited on fracture surfaces of alpha-Al2O3 ceramics", Proc. SPIE 2364, Second International Conference on Thin Film Physics and Applications, (26 October 1994); doi: 10.1117/12.190767; https://doi.org/10.1117/12.190767
PROCEEDINGS
5 PAGES


SHARE
Back to Top