26 October 1994 Influence of etching solution for high-Tc superconducting thin film
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Proceedings Volume 2364, Second International Conference on Thin Film Physics and Applications; (1994) https://doi.org/10.1117/12.190811
Event: Thin Film Physics and Applications: Second International Conference, 1994, Shanghai, China
Abstract
This paper reports a wet etching technique for the pattern of high-Tc superconducting thin film. The solutions of 3% H3PO4, saturated EDTA and saturated NH4CL are used as the etchants. The samples of YBCO high-Tc superconducting thin film are etched with the etching solutions. The measure results show that the influence of the etching solutions on Tc is related to the bridge width. The measure results for 50 micrometers , 5 micrometers , and 2 micrometers bridge widths are given and the X-T and R-T curves of the samples are provided in this paper.
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S. P. Guo, S. P. Guo, J. M. Zhang, J. M. Zhang, Qin Xi Xie, Qin Xi Xie, Shixin Yuan, Shixin Yuan, } "Influence of etching solution for high-Tc superconducting thin film", Proc. SPIE 2364, Second International Conference on Thin Film Physics and Applications, (26 October 1994); doi: 10.1117/12.190811; https://doi.org/10.1117/12.190811
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