Influence of pretreatments and deposition parameters on diamond nucleation density in diamond film deposition by hot filament CVD

Zhuo Sun; Zhihao Zheng; Ning Xu

doi:10.1117/12.190719

26 October 1994 Influence of pretreatments and deposition parameters on diamond nucleation density in diamond film deposition by hot filament CVD

Zhuo Sun, Zhihao Zheng, Ning Xu

Author Affiliations +

Proceedings Volume 2364, Second International Conference on Thin Film Physics and Applications; (1994) https://doi.org/10.1117/12.190719
Event: Thin Film Physics and Applications: Second International Conference, 1994, Shanghai, China

Abstract

In synthsis of diamond thin film by Hot Filment Chemical Vapor Deposition (HF-CVD), many factors can affect diamond nucleation. The mechanical pretreatments, scratching with diamond paste or ultrasonic irradiation with diamond powder suspensions, and the chemical pretreatment, such as erosion with a solution of HF-HNO₃, can create many defects on the surface of silicon substrate and promote the diamond nucleation density. Also, diamond nucleation density can be promoted with carbide intermediate layer of diamond-like carbon film on polished silicon substrate. Diamond nucleation can be varied with different deposition parameters, among the deposition parameters, CH₄/H₂ ratio and substrate temperatures influence the diamond nucleation effectively.

Citation Download Citation

Zhuo Sun, Zhihao Zheng, and Ning Xu "Influence of pretreatments and deposition parameters on diamond nucleation density in diamond film deposition by hot filament CVD", Proc. SPIE 2364, Second International Conference on Thin Film Physics and Applications, (26 October 1994); https://doi.org/10.1117/12.190719

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