Application of FTIR to semiconductor emissions monitoring

Robert L. Spellicy; J. P. LaCosse; David M. Hull; S. J. Cain; Gerald Pophal

doi:10.1117/12.205562

10 February 1995 Application of FTIR to semiconductor emissions monitoring

Robert L. Spellicy, J. P. LaCosse, David M. Hull, S. J. Cain, Gerald Pophal

Proceedings Volume 2366, Optical Instrumentation for Gas Emissions Monitoring and Atmospheric Measurements; (1995) https://doi.org/10.1117/12.205562
Event: Optical Sensing for Environmental and Process Monitoring, 1994, McLean, VA, United States

Abstract

A program was undertaken to evaluate FTIR for use in monitoring acid and solvent stacks in the semiconductor industry. The program consisted of an initial laboratory feasibility effort followed by field testing and ultimately a system development program. The clear result of the feasibility and field tests was that FTIR is an appropriate technology for use with these sources. In this paper we present the details of the laboratory and field tests and briefly outline the system that was developed as a result of the program. 12

Citation Download Citation

Robert L. Spellicy, J. P. LaCosse, David M. Hull, S. J. Cain, and Gerald Pophal "Application of FTIR to semiconductor emissions monitoring", Proc. SPIE 2366, Optical Instrumentation for Gas Emissions Monitoring and Atmospheric Measurements, (10 February 1995); https://doi.org/10.1117/12.205562

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