New Lenses For Microlithography

Erhard Glatzel

doi:10.1117/12.959098

16 September 1980 New Lenses For Microlithography

Erhard Glatzel

Proceedings Volume 0237, 1980 International Lens Design Conference; (1980) https://doi.org/10.1117/12.959098
Event: 1980 International Lens Design Conference, 1980, Oakland, United States

Abstract

Giving the imaging bundle of rays two substantial bulges makes it possible to design 10x reduction lenses with large aperture and field size for microlithography without using high index glasses with poor transmission.

Citation Download Citation

Erhard Glatzel "New Lenses For Microlithography", Proc. SPIE 0237, 1980 International Lens Design Conference, (16 September 1980); https://doi.org/10.1117/12.959098

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