3 March 1995 Pulsed-power microwave surface discharge in vacuum for diamond-like films deposition
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Proceedings Volume 2374, Novel Applications of Lasers and Pulsed Power; (1995); doi: 10.1117/12.204992
Event: Photonics West '95, 1995, San Jose, CA, United States
Abstract
This paper is devoted to a new method of depositing diamond-like films onto various substrates by use of a plasma flare generated by a surface discharge on a carbon target in vacuum under action of intense pulsed microwave (MW) beam. The first part of the report presents a brief review of experimental investigations of nonlinear interaction of strong microwaves (X-band, MW intensities of 0.01-10 MW/cm2, and pulse duration of 50-100 ns, 1-100 microsecond(s) ) with a plasma flare. A generation of strong Lengmuir waves and the following electron acceleration in a plasma resonance region cause an effective transformation of a MW energy into a plasma flare, a creation of high plasma potentials, and a production of ions with energies from thermal to as high as tens keV. The second part reflects the first experiments on pulsed MW deposition of diamond-like films on various substrates. Deposition rate up to 0.5 micrometers per 1 sec of a 'net' MW irradiation time was reached, and diamond- like films with good optical characteristics were obtained. The small plasma-reactor bench, other obtained practical results, and technique perspectives are discussed in detail.
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Alexander A. Ravaev, Alexander V. Medvedovsky, Pavel S. Chernyshev, "Pulsed-power microwave surface discharge in vacuum for diamond-like films deposition", Proc. SPIE 2374, Novel Applications of Lasers and Pulsed Power, (3 March 1995); doi: 10.1117/12.204992; https://doi.org/10.1117/12.204992
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KEYWORDS
Medium wave

Plasma

Microwave radiation

Ions

Carbon

Electrodes

Sputter deposition

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