Ion-Etched Gratings For Laser Applications

Hugh L. Garvin; Anson Au; Monica L. Minden

doi:10.1117/12.965636

10 February 1981 Ion-Etched Gratings For Laser Applications

Hugh L. Garvin, Anson Au, Monica L. Minden

Proceedings Volume 0240, Periodic Structures, Gratings, Moire Patterns, and Diffraction Phenomena I; (1981) https://doi.org/10.1117/12.965636
Event: 24th Annual Technical Symposium, 1980, San Diego, United States

Abstract

Ion beam sputter etching has proven to be a superior technique for producing grating sampling mirrors for large optical systems. The patterns to be etched are defined by a photoresist masking film on the mirror surface. Grating patterns have been produced on laser mirrors by replication of diamond-scribed master patterns, while holographic construction has been used to produce linear and nonlinear gratings. The microscopic details of ion etched grating profiles show that the process is capable of high resolution pattern delineation and large area device fabrication.

Citation Download Citation

Hugh L. Garvin, Anson Au, and Monica L. Minden "Ion-Etched Gratings For Laser Applications", Proc. SPIE 0240, Periodic Structures, Gratings, Moire Patterns, and Diffraction Phenomena I, (10 February 1981); https://doi.org/10.1117/12.965636

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