NIR high-efficiency subwavelength diffractive structures in semiconductors

Robert E. Smith; Mial E. Warren; Joel R. Wendt; G. Allen Vawter

doi:10.1117/12.207462

20 April 1995 NIR high-efficiency subwavelength diffractive structures in semiconductors

Robert E. Smith, Mial E. Warren, Joel R. Wendt, G. Allen Vawter

Proceedings Volume 2404, Diffractive and Holographic Optics Technology II; (1995) https://doi.org/10.1117/12.207462
Event: Photonics West '95, 1995, San Jose, CA, United States

Abstract

We have fabricated sub-wavelength diffractive optical elements with binary phase profiles for operation at 975 nm. Blazed transmission gratings with minimum features 63 nm wide were designed by using rigorous coupled-wave analysis and fabricated by direct-write e-beam lithography and reactive ion beam etching in gallium arsenide. Transmission measurements show 85% diffraction efficiency into the first order. Anti-reflection surfaces, with features 42 nm wide were also designed and fabricated.

Citation Download Citation

Robert E. Smith, Mial E. Warren, Joel R. Wendt, and G. Allen Vawter "NIR high-efficiency subwavelength diffractive structures in semiconductors", Proc. SPIE 2404, Diffractive and Holographic Optics Technology II, (20 April 1995); https://doi.org/10.1117/12.207462

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available