Translator Disclaimer
24 April 1995 Cost-effective projection lithography for thin film displays
Author Affiliations +
Proceedings Volume 2408, Liquid Crystal Materials, Devices, and Displays; (1995) https://doi.org/10.1117/12.207516
Event: IS&T/SPIE's Symposium on Electronic Imaging: Science and Technology, 1995, San Jose, CA, United States
Abstract
A new type of high definition large area photolithography system, based on scanning projection lithography, has been developed and successfully implemented as a tool for flat panel display manufacturing. The machines built on this principle have a resolution of better than 4 micrometers and can expose areas of 500 mm X 600 mm (20' X 24'). Comparison of the complexities of the ways and means to obtain these specifications leads to the conclusion that this equipment is highly cost effective. To support this claim, results of a cost of ownership model are presented.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ronald E. Sheets and Heinrich G. Mueller "Cost-effective projection lithography for thin film displays", Proc. SPIE 2408, Liquid Crystal Materials, Devices, and Displays, (24 April 1995); https://doi.org/10.1117/12.207516
PROCEEDINGS
6 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Ion projection: the successor to optical lithography
Proceedings of SPIE (May 13 1994)
Some lithographic limits of back end lithography
Proceedings of SPIE (April 26 2001)
Blossom overlay metrology implementation
Proceedings of SPIE (April 05 2007)
The Paths To Subhalf-Micrometer Optical Lithography
Proceedings of SPIE (January 01 1988)
Methods to print optical images at low-k1 factors
Proceedings of SPIE (June 01 1990)

Back to Top