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24 April 1995 Cost-effective projection lithography for thin film displays
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Proceedings Volume 2408, Liquid Crystal Materials, Devices, and Displays; (1995)
Event: IS&T/SPIE's Symposium on Electronic Imaging: Science and Technology, 1995, San Jose, CA, United States
A new type of high definition large area photolithography system, based on scanning projection lithography, has been developed and successfully implemented as a tool for flat panel display manufacturing. The machines built on this principle have a resolution of better than 4 micrometers and can expose areas of 500 mm X 600 mm (20' X 24'). Comparison of the complexities of the ways and means to obtain these specifications leads to the conclusion that this equipment is highly cost effective. To support this claim, results of a cost of ownership model are presented.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ronald E. Sheets and Heinrich G. Mueller "Cost-effective projection lithography for thin film displays", Proc. SPIE 2408, Liquid Crystal Materials, Devices, and Displays, (24 April 1995);


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