24 April 1995 Dry etching for the fabrication of flat panel displays
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Abstract
The technique of dry etching as applied to the patterning of thin films is described, and compared to wet etching in terms of the etch precision and in terms of the usage and disposal of etch chemicals. The etch requirements of three representative display technologies (AMLCD, FED and EL) are outlined, and the range of plasma etch processes which are applicable to these requirements is described.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Curt Barratt, Curt Barratt, David J. Johnson, David J. Johnson, Chris Constantine, Chris Constantine, "Dry etching for the fabrication of flat panel displays", Proc. SPIE 2408, Liquid Crystal Materials, Devices, and Displays, (24 April 1995); doi: 10.1117/12.207515; https://doi.org/10.1117/12.207515
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