6 June 1995 Fabrication of microlens array for the IR by lithographic processes using an inorganic chalcogenide photoresist
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Proceedings Volume 2426, 9th Meeting on Optical Engineering in Israel; (1995) https://doi.org/10.1117/12.211195
Event: Optical Engineering in Israel: 9th Meeting, 1994, Tel-Aviv, Israel
Abstract
Micro-optical elements, particularly microlenses, are finding growing application in different fields of modern optoelectronics. One of the most promising methods of microlens fabrication is based on photolithographic processes. Organic photoresists were used in the earlier development of microlens arrays. A new technique of microlens fabrication using inorganic chalcogenide photoresists is presented. Such photoresists have many advantages, such as very high resolution, photosensitivity in wide spectral range, high values of refractive index, transparency in the IR range, and the ability to be used as positive or negative resists depending on the developer used. These unique properties create new possibilities for the development of microlens arrays in the IR.
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Naftali Paul Eisenberg, M. Manevich, Matvei Klebanov, S. Shutina, Victor Lyubin, "Fabrication of microlens array for the IR by lithographic processes using an inorganic chalcogenide photoresist", Proc. SPIE 2426, 9th Meeting on Optical Engineering in Israel, (6 June 1995); doi: 10.1117/12.211195; https://doi.org/10.1117/12.211195
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