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14 July 1995 Development of plasma-enhanced CVD for multilayer mirror coatings (Abstract Only)
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Abstract
PECVD is an attractive technique for depositing coatings of refractory optical materials because of the ability to control composition (to assure low absorption), the low substrate temperature required, and the high deposition rate attainable. Deposition processes have been established that achieve thin films with low absorption, low scatter, good thickness uniformity, and environmental durability. Multilayer dielectric- enhanced IR reflectance mirrors using a variety of silicon-based refractory materials have been fabricated and evaluated. Results of optical and physical characterizations and environmental testing will be presented.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Carl B. Freidhoff, Harry Buhay, William D. Partlow, Donald L. Decker, and Karl A. Klemm "Development of plasma-enhanced CVD for multilayer mirror coatings (Abstract Only)", Proc. SPIE 2428, Laser-Induced Damage in Optical Materials: 1994, (14 July 1995); https://doi.org/10.1117/12.213717
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