14 July 1995 Laser-induced damage in optical materials under UV excimer laser radiation
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Abstract
The studies of laser damage resistance of silica glass and fluoride crystals performed at ArF, KrF, and XeF excimer laser wavelengths with a pulse duration of approximately 80 ns have given the following data: the dependence of the bulk damage threshold on irradiated spot size, ranging in value from 6 to 1200 micrometers ; temperature dependence of laser damage resistance; the influence of metal admixtures on damage threshold; the influence of ionizing radiation on damage resistance; the coefficients of nonlinear absorption; frequency dependence of the bulk damage threshold for silica glass in the UV region.
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Nikolay V. Morozov, Nikolay V. Morozov, } "Laser-induced damage in optical materials under UV excimer laser radiation", Proc. SPIE 2428, Laser-Induced Damage in Optical Materials: 1994, (14 July 1995); doi: 10.1117/12.213751; https://doi.org/10.1117/12.213751
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