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Electrical linewidth measurements and simulations studying the effects of dose and gap on exposure latitude in x-ray lithography
Exposure and characterization of superstructure gratings for DBR lasers generated by direct write electron-beam lithography
High-energy (100-keV) e-beam lithography applied for fabrication of deep-submicrometer SAW devices on lithium niobate and quartz
Focused ion beam deposition of new materials: dielectric films for device modification and mask repair, and tantalum films for x-ray mask repair
Assessment of silicon carbide x-ray mask overlay performance in the IBM Advanced Lithography Facility x-ray stepper
Application of smoothing techniques to relief-type resist surfaces generated by direct write electron-beam lithography
Error measure comparison of currently employed dose-modulation schemes for e-beam proximity effect control