Application of smoothing techniques to relief-type resist surfaces generated by direct write electron-beam lithography

Herbert Engel; Joerg Wengelink; Ralf Steingrueber

doi:10.1117/12.209177

19 May 1995 Application of smoothing techniques to relief-type resist surfaces generated by direct write electron-beam lithography

Herbert Engel, Joerg Wengelink, Ralf Steingrueber

Author Affiliations +

Proceedings Volume 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V; (1995) https://doi.org/10.1117/12.209177
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

Complex relief-type resist surfaces are of increasing interest for applications in optical and photonic devices. They can be fabricated by using direct write electron beam lithography. The crucial point in the fabrication of such reliefs is the inexact approach to the desired resist profile and the increased roughness of the resist surface. This work focusses on three important steps towards a better realization of smooth profiles, i.e. an improvement in beam position accuracy, a reduction of exposure errors caused by the insufficiency of the conversion software and a smoothing technique applied after development. The introduced techniques are expected to considerably improve the functionality of relief type devices.

Citation Download Citation

Herbert Engel, Joerg Wengelink, and Ralf Steingrueber "Application of smoothing techniques to relief-type resist surfaces generated by direct write electron-beam lithography", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209177

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