Characteristics of the x-ray/EUV emission from spherically pinched and vacuum spark sources

Liyan Zhang; Emilio Panarella; B. Hilko; Haibo Chen

doi:10.1117/12.209173

19 May 1995 Characteristics of the x-ray/EUV emission from spherically pinched and vacuum spark sources

Liyan Zhang, Emilio Panarella, B. Hilko, Haibo Chen

Proceedings Volume 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V; (1995) https://doi.org/10.1117/12.209173
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

In this paper we describe the performances of two kinds of high-flux radiation sources that have been developed at Advanced Laser and Fusion Technology, Inc. The first kind is the spherical pinch which exploits the principle of spherical convergence of strong shock waves in noble gases to generate a hot plasma at the center of a spherical vessel. The temperature of the central plasma can be high enough for emission of broadband radiations from the UV to the soft X-ray region of the spectrum. The second kind is the vacuum spark in which a capacitor is discharged through two properly shaped electrodes in a high vacuum. During the discharge minute spots of hot plasmas are formed on or around the electrodes and strong line radiation (characteristic of the electrode materials) can be generated in the soft X-ray region. High repetition rate operation of the vacuum spark may lead to the dosage required by the submicron lithography technology.

Citation Download Citation

Liyan Zhang, Emilio Panarella, B. Hilko, and Haibo Chen "Characteristics of the x-ray/EUV emission from spherically pinched and vacuum spark sources", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209173

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