Creation of a topology in metal phthalocyanine layers

Elena Fedorovna Reznikova; Stalina A. Prokhorova; T. V. Basova; B. M. Ajupov; Vladimir P. Naz'mov; I. A. Makarov; Igor K. Igumenov; Jurij H. Krieger

doi:10.1117/12.209179

19 May 1995 Creation of a topology in metal phthalocyanine layers

Elena Fedorovna Reznikova, Stalina A. Prokhorova, T. V. Basova, B. M. Ajupov, Vladimir P. Naz'mov, I. A. Makarov, Igor K. Igumenov, Jurij H. Krieger

Author Affiliations +

Proceedings Volume 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V; (1995) https://doi.org/10.1117/12.209179
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

The influence of synchrotron radiation on the vacuum-deposited layers of copper and aluminum phthalocyanines was investigated. For creation of patterns in these layers the x-ray radiation exposing and vacuum thermal development were used. It was established that the layers of copper phthalocyanine possess the properties of both positive and negative vacuum x- ray resist upon radiation exposure of 5 kJ/cm³ and 35 kJ/cm³ accordingly. The layers of aluminum phthalocyanine possess the properties of only negative vacuum x-ray resists. The possibility of creating submicron topology in layers of metal phthalocyanines has been demonstrated.

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Elena Fedorovna Reznikova, Stalina A. Prokhorova, T. V. Basova, B. M. Ajupov, Vladimir P. Naz'mov, I. A. Makarov, Igor K. Igumenov, and Jurij H. Krieger "Creation of a topology in metal phthalocyanine layers", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209179

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