Creation of a topology in metal phthalocyanine layers

Elena Fedorovna Reznikova; Stalina A. Prokhorova; T. V. Basova; B. M. Ajupov; Vladimir P. Naz'mov; I. A. Makarov; Igor K. Igumenov; Jurij H. Krieger

doi:10.1117/12.209179

19 May 1995 Creation of a topology in metal phthalocyanine layers

Elena Fedorovna Reznikova, Stalina A. Prokhorova, T. V. Basova, B. M. Ajupov, Vladimir P. Naz'mov, I. A. Makarov, Igor K. Igumenov, Jurij H. Krieger

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Proceedings Volume 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V; (1995) https://doi.org/10.1117/12.209179
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

The influence of synchrotron radiation on the vacuum-deposited layers of copper and aluminum phthalocyanines was investigated. For creation of patterns in these layers the x-ray radiation exposing and vacuum thermal development were used. It was established that the layers of copper phthalocyanine possess the properties of both positive and negative vacuum x- ray resist upon radiation exposure of 5 kJ/cm³ and 35 kJ/cm³ accordingly. The layers of aluminum phthalocyanine possess the properties of only negative vacuum x-ray resists. The possibility of creating submicron topology in layers of metal phthalocyanines has been demonstrated.

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Elena Fedorovna Reznikova, Stalina A. Prokhorova, T. V. Basova, B. M. Ajupov, Vladimir P. Naz'mov, I. A. Makarov, Igor K. Igumenov, and Jurij H. Krieger "Creation of a topology in metal phthalocyanine layers", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209179

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KEYWORDS

X-rays

Metals

Aluminum

Copper

Refractive index

Thin films

Gold

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