Exposure and characterization of superstructure gratings for DBR lasers generated by direct write electron-beam lithography

Ralf Steingrueber; Herbert Engel; R. Loeffler; C. Sakkas

doi:10.1117/12.209160

19 May 1995 Exposure and characterization of superstructure gratings for DBR lasers generated by direct write electron-beam lithography

Ralf Steingrueber, Herbert Engel, R. Loeffler, C. Sakkas

Author Affiliations +

Proceedings Volume 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V; (1995) https://doi.org/10.1117/12.209160
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

Semiconductor lasers with a wide tuning range can be fabricated with the use of super structure gratings (SSG). In this paper we give a short introduction to SSGs, the technical problem of their realization and the existing techniques to generate SSGs. A method is presented to generate 'true' continuously chirped gratings overcoming the technical restrictions. Furthermore we make a proposal how to characterize SSGs in resist profiles.

Citation Download Citation

Ralf Steingrueber, Herbert Engel, R. Loeffler, and C. Sakkas "Exposure and characterization of superstructure gratings for DBR lasers generated by direct write electron-beam lithography", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209160

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