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19 May 1995 Exposure and characterization of superstructure gratings for DBR lasers generated by direct write electron-beam lithography
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Abstract
Semiconductor lasers with a wide tuning range can be fabricated with the use of super structure gratings (SSG). In this paper we give a short introduction to SSGs, the technical problem of their realization and the existing techniques to generate SSGs. A method is presented to generate 'true' continuously chirped gratings overcoming the technical restrictions. Furthermore we make a proposal how to characterize SSGs in resist profiles.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ralf Steingrueber, Herbert Engel, R. Loeffler, and C. Sakkas "Exposure and characterization of superstructure gratings for DBR lasers generated by direct write electron-beam lithography", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209160
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