19 May 1995 Low-voltage electron-beam lithography linked to photolithography
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Abstract
An advanced resist process is introduced connecting the high resolution of low voltage electron beam lithography (LV-EBL) and the high productivity of photolithography using a surface imaging technique. A method to overlay these two exposures will be introduced. A pattern transfer below 100 nm is achieved.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lothar Bauch, Monika Boettcher, Ulrich Haak, Ulrich A. Jagdhold, "Low-voltage electron-beam lithography linked to photolithography", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); doi: 10.1117/12.209178; https://doi.org/10.1117/12.209178
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