19 May 1995 Low-voltage electron-beam lithography linked to photolithography
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Abstract
An advanced resist process is introduced connecting the high resolution of low voltage electron beam lithography (LV-EBL) and the high productivity of photolithography using a surface imaging technique. A method to overlay these two exposures will be introduced. A pattern transfer below 100 nm is achieved.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lothar Bauch, Lothar Bauch, Monika Boettcher, Monika Boettcher, Ulrich Haak, Ulrich Haak, Ulrich A. Jagdhold, Ulrich A. Jagdhold, } "Low-voltage electron-beam lithography linked to photolithography", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); doi: 10.1117/12.209178; https://doi.org/10.1117/12.209178
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