19 May 1995 Optical system design issues in development of projection camera for EUV lithography
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Abstract
Optical system design issues are described in development of a four- mirror 4x reduction ring-field system for EUV projection lithography at 13 nm wavelength.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tanya E. Jewell, "Optical system design issues in development of projection camera for EUV lithography", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); doi: 10.1117/12.209170; https://doi.org/10.1117/12.209170
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