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19 May 1995 Optical system design issues in development of projection camera for EUV lithography
Tanya E. Jewell
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Proceedings Volume 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V; (1995) https://doi.org/10.1117/12.209170
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States
Abstract
Optical system design issues are described in development of a four- mirror 4x reduction ring-field system for EUV projection lithography at 13 nm wavelength.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Tanya E. Jewell, Tanya E. Jewell, } "Optical system design issues in development of projection camera for EUV lithography", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); doi: 10.1117/12.209170; https://doi.org/10.1117/12.209170
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