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19 May 1995Optical system design issues in development of projection camera for EUV lithography
Optical system design issues are described in development of a four- mirror 4x reduction ring-field system for EUV projection lithography at 13 nm wavelength.
Tanya E. Jewell
"Optical system design issues in development of projection camera for EUV lithography", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209170
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Tanya E. Jewell, "Optical system design issues in development of projection camera for EUV lithography," Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209170