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19 May 1995 Toward a commercial gas field ion source
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Abstract
Focused ion beam systems have traditionally used liquid gallium as the ion source material. It may now be possible to have high current density focused beams of gas ions like hydrogen, helium, neon, and oxygen. This paper discusses the progress recently made toward the commercialization of an alternative to gallium, the gas field ion source, or GFIS.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
William B. Thompson, A. Armstrong, S. Etchin, Raymond Hill, Sigfried Kalbitzer, R. Percival, A. Saxonis, and Christoph Wilbertz "Toward a commercial gas field ion source", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209185
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