9 June 1995 Chemically amplified resist convertible into inorganic silicate glass (GPR)
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Abstract
We have developed a unique chemically amplified negative-type resist composed of poly(t- butoxysiloxane) and photoacid generator, the GPR (glass precursor resist), which can be converted into inorganic silicate glass. Poly(t-butoxysiloxane) is a specially designed SiO2 precursor masked by t-butoxyl groups. To confirm the mechanism of condensation to SiO2 an intermediate trapping experiment was carried out. GPR exposed at a low dose is fully developed by alkaline solution to give a positive tone; on the other hand, high-dosage GPR gives negative tone by means of organic solvent development. They correspond to the formation of poly(hydroxysilane) and SiO2 respectively. Deprotection proceeds readily even at low temperature, whereas condensation requires thermal assistance. Decreasing the content of t-butoxyl groups enhances the sensitivities to electron beam exposure. Precursor polymers with several degrees of branching were synthesized. The high-branching polymer provides high sensitivity because its network grows abruptly with condensation. GPR has high resolution and high sensitivity. The fine patterns can be resolved with the practical dose latitude using an electron beam direct-writing system.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Miwa Sakata, Maki Kosuge, Hideyuki Jinbo, Toshio Ito, "Chemically amplified resist convertible into inorganic silicate glass (GPR)", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); doi: 10.1117/12.210370; https://doi.org/10.1117/12.210370
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