Effect of PAC structure and resist morphology on the control of surface inhibition in positive photoresist systems

Bernard T. Beauchemin Jr.; Rodney J. Hurditch; Medhat A. Toukhy; Andrew J. Blakeney

doi:10.1117/12.210349

9 June 1995 Effect of PAC structure and resist morphology on the control of surface inhibition in positive photoresist systems

Bernard T. Beauchemin Jr., Rodney J. Hurditch, Medhat A. Toukhy, Andrew J. Blakeney

Author Affiliations +

Proceedings Volume 2438, Advances in Resist Technology and Processing XII; (1995) https://doi.org/10.1117/12.210349
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

The influence of PAC structure and morphology on the surface induction in novolak based resist systems was investigated. Variation in surface induction for a given PAC is caused by changes in the morphology between the surface and the bulk of the resist film resulting from solvent depletion and is characteristic of the novolak. PAC structure, particularly its functionality [i.e., maximum amount of diazonaphthoqunione (DNQ) esterifiable OH], was found to greatly influence the amount of surface inhibition.

Citation Download Citation

Bernard T. Beauchemin Jr., Rodney J. Hurditch, Medhat A. Toukhy, and Andrew J. Blakeney "Effect of PAC structure and resist morphology on the control of surface inhibition in positive photoresist systems", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); https://doi.org/10.1117/12.210349

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