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9 June 1995 Environmentally stable chemically amplified resist effects of organic salt additives
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Incorporation of organic salt additives consisting of an organic acid and organic base improves the resist stability. The sensitivity of a t-BOC resist without the salt decreased to 1/4 after standing for one hour after deep-UV exposure. Typical T-top patterns were obtained on this resist by a KrF excimer laser stepper (NA equals 0.45), and a half-micron resolution was barely obtained. On the other hand, a t-BOC resist, with an organic salt, consisting of p- toluenesulfonic acid and dicyclohexylamine (PTS/DCHA), showed no change in sensitivity after one hour. The resist with the PTS/DCHA achieved a 0.3-micrometers resolution line-and- space pattern without environmental control or a protective topcoat.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ei Yano, Yohko Kuramitsu, Keiji Watanabe, Takahisa Namiki, Koji Nozaki, and Miwa Igarashi "Environmentally stable chemically amplified resist effects of organic salt additives", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995);

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